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CuO/UV/过硫酸盐体系深度降解印染废水 被引量:10

Advanced Degradation of Dying Wastewater by CuO/UV/Persulfate System
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摘要 采用浸渍法制备了CuO/ZSM-5复合催化剂,并通过SEM、XRD、FT-IR等手段对材料形貌结构性质进行了表征。以模拟印染废水中的甲基橙、活性蓝4和苯胺为目标污染物,在紫外光辐射中,考察了常温条件下催化剂投加量、过硫酸盐投加量、pH值和污染物初始浓度等因素对降解性能的影响,同时对降解过程进行了动力学分析并探讨了降解机理。结果表明,CuO/UV/过硫酸盐体系在较大pH值范围内能有效降解目标污染物并具有降解长效性。当催化剂投加量为1.5g/L、过硫酸盐投加量为1.0 g/L、pH值为3时,苯胺去除率可达97.7%,出水苯胺浓度符合《纺织染整工业水污染物排放标准》(GB 4287—2012)。CuO/UV/过硫酸盐体系动力学遵循LangmuirHinshelwood方程,苯胺降解的速率常数为0.021 4~0.047 5 mg/(L·min),对模拟印染废水降解产生主导作用的是·OH和SO_4^-·。 The CuO/ZSM-5 composite catalyst was prepared by impregnation method, and the structural and morphology properties of the material were characterized by SEM, XRD and FT-IR. Taking the simulated dyeing wastewater ( MO, RB4 and aniline) as target contaminants, the effects of dosages of catalyst and persulfate, initial pH values, dyes concentration and other factors on the degradation performance were investigated under the condition of UV irradiation and room temperature, and the kinetic analysis and degradation mechanism were discussed. The results showed that CuO/UV/persulfate system could effectively degrade target contaminants over a wide range of pH and keep a long-term degradation effect. The removal rate of aniline could reach more than 97.7% when the catalyst dosage was 1.5 g/L, the persulfate dosage was 1.0 g/L and the initial pH was 3. The aniline concentration in the effluent could meet the requirement of aniline 〈 1.0 mg/L in the Discharge Standard of Water Pollutants for Dyeing and Finishing of Textile Industry (GB 4287 -2012). The kinetics of CuO/ZSM-5 photocatalytic system fit well Langmuir-Hinshelwood equation, the rate constant of aniline was 0. 021 4 to 0. 047 5 rag/( L · min), and the dominant role for degradation of the simulated dyeing wastewater was · OH and SO4^-· .
出处 《中国给水排水》 CAS CSCD 北大核心 2016年第19期89-94,共6页 China Water & Wastewater
基金 安徽省自然科学基金资助项目(1608085ME118) 安徽省高校优秀青年人才重点项目(gxyq ZD2016120)
关键词 CuO/ZSM-5 光催化氧化 过硫酸盐 印染废水 苯胺 CuO/ZSM-5 photocatalytic oxidation persulfate dyeing wastewater aniline
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