摘要
为制作高质量的铋吸收光栅以提高X射线微分相衬成像系统性能,针对表面改性环节对微铸造技术进行改进,以Bi2O_3取代Si O_2作为改进的浸润层.在周期为3μm、深度为150μm的分析光栅结构上制作了具有高填充率的分析光栅,获得了该光栅的扫描电子显微镜照片.为进一步表明改进微铸造技术制作分析光栅的优越性,与改进前的分析光栅进行对比.将两种光栅先后置于X射线微分干涉相衬成像系统中,分别获取了系统莫尔条纹.从最终的条纹对比度上判断,改进后的微铸造技术制作的分析光栅填充率明显提高.
To fabricate high performance Bi absorption gratings for use in X-ray differential phase-contrast imaging（ DPCI）,the micro-casting method was improved via surface modification. Bi_2O_3 was used in place of SiO_2as an improved wetting layer. A scanning electron microscopy showed that a high filling-ratio analyzer grating with a period of3 μm and a depth of 150 μm was obtained. Furthermore,the superiority of the presented analyzer grating to the one fabricated using the traditional micro-casting method was revealed through a comparison of moiré patterns. These tests demonstrate an enhancement to the micro-casting method for the fabrication of absorption gratings.
出处
《深圳大学学报（理工版）》
EI
CAS
CSCD
北大核心
2016年第5期506-510,共5页
Journal of Shenzhen University(Science and Engineering)
基金
National Special Foundation of China for Major Science Instrument(61227802)
National Natural Science Foundation of China(61405120)
关键词
光学工程
X射线
相衬
吸收光栅
微铸造
莫尔条纹
铋
optical engineering
X-ray
phase contrast
absorption grating
micro-casting
moiré fringe
bismuth
