摘要
阐述了BN界面的优异性能和CVD制备工艺的优缺点,主要介绍了CVD-BN制备过程中沉积温度、源气体比例、热处理温度等各因素的影响,指出CVD法是制备高品质BN界面涂层的优选方法。优化CVD工艺,对其制备原理进行深入研究,将是BN界面涂层研究的重点,获得特定结构、性能稳定、厚度可控的BN界面相涂层是CVD法制备BN界面相涂层的难点。
The characteristics of BN and CVD are reviewed. Then the deposition process and the effect of deposition temperature,source gases composition,heat treatment during the preparation by CVD are summarized. The stabilization of process conditions and the reaction mechanism will be the trend for the development of BN coatings. The method to obtain uniform,controllable thickness and ordered BN interface coatings will be forced in the future study.
出处
《宇航材料工艺》
CAS
CSCD
北大核心
2016年第4期8-12,28,共6页
Aerospace Materials & Technology
基金
航空科学基金SiCf/SiC复合陶瓷浮动壁应用的基础研究(2013 ZFS6001)
