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低压扩散机理及其对扩散方阻均匀性的影响研究 被引量:1

Study about Low Pressure Diffusion Mechanism and its Influence of Diffusion Sheet Resistance Uniformity
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摘要 传统的太阳能电池扩散工艺采用常压扩散,随着高效晶硅电池的发展,扩散结深的不断变浅,常压扩散已难以满足晶体硅太阳能电池高效、低成本发展的技术要求。低压扩散通过在反应管内提供低压工艺环境,提升扩散制结的性能。通过对低压扩散机理的详细分析,从扩散分子自由程、掺杂原子分压比和气场均匀性等方面详细分析了低压扩散对高方阻均匀性的影响关系。采用新型低压扩散炉进行工艺实验测试,结果表明,低压扩散在可达到扩散方阻目标值110Ω时获得更好的均匀性,载片量较常压扩散大幅度提升,具有无可比拟的生产优势,是未来扩散技术的主要发展方向。 The traditional solar cell diffusion process is atmospheric. With the development of efficient crystalline silicon,diffused junction depth becomes shallow,atmospheric diffusion has been difficult to meet the industry demand for high efficiency and low cost. Low pressure diffusion furnace improves the performance of diffused junction,through giving low pressure process environment in the reaction tube. In this paper,the low pressure diffusion mechanism is analyzed in detail from the following several aspects: molecular free path,impurity atom ratio,uniformity of the aura and their influence on the uniformity of high sheet resistance. The experiment results show that low pressure diffusion process can achieve higher sheet resistance uniformity at 110 ohms and more loading quantity then atmospheric diffusion furnace. So low pressure diffusion has incomparable advantages,it is the future main direction of diffusion technique.
作者 张宝锋 陈晖
出处 《电子工业专用设备》 2016年第7期10-14,共5页 Equipment for Electronic Products Manufacturing
关键词 低压扩散 高方阻 均匀性 Low pressure diffusion High sheet resistance Uniformity
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