摘要
采用多弧离子镀技术和Ti-Al-Zr合金靶及Cr单质靶,在WC-8%Co硬质合金基体上制备了（Ti,Al,Zr）N/（Ti,Al,Zr,Cr）N和Cr N/（Ti,Al,Zr,Cr）N 2种四元双层氮化物膜。利用扫描电镜（SEM）、能谱仪（EDS）和X射线衍射仪（XRD）分析2种双层膜的微观组织、成分和结构;利用划痕仪和显微硬度计对比2种双层膜的力学性能。结果表明,获得的2种双层膜均具有B1-NaCl型的TiN面心立方结构;双层膜的组织均是典型的柱状晶结构;沉积偏压为–50-–200 V时,双层膜的力学性能均优于（Ti,Al,Zr,Cr）N单层膜,并与Ti-Al-Zr-Cr-N系梯度膜的力学性能相当,同时（Ti,Al,Zr）N/（Ti,Al,Zr,Cr）N双层膜可获得更高的硬度（HV（0.01）最高值为41 GPa）,而CrN/（Ti,Al,Zr,Cr）N双层膜可获得更强的膜层与基体间结合力（所有值均大于200 N）。
The（Ti, Al, Zr）N/（Ti, Al, Zr, Cr）N and CrN/（Ti, Al, Zr, Cr）N four-component bilayer nitride films were deposited on cemented carbide（WC-8%Co） substrates by a multi-arc ion plating technique using the combined Ti-Al-Zr alloy and pure Cr targets. The morphology, composition and crystalline structure of two bilayer films were analyzed by scanning electron microscopy（SEM）, energy disperse X-ray spectroscopy（EDS） and X-ray diffraction（XRD）. Scratch test and Vickers microindentation were used to compare the mechanical properties of the two bilayer films. It is shown that the two prepared bilayer films are still the TiN（B1-NaCl） face-centered cubic structure. The cross-sectional morphologies are typical columnar crystal structures. As the bias voltages vary from –50 to –200 V, the mechanical properties of the two bilayer films are better than those of the（Ti, Al, Zr, Cr）N monolayer films and almost close to those of the Ti-Al-Zr-Cr-N gradient films. The microhardness of the（Ti, Al, Zr）N/（Ti, Al, Zr, Cr）N bilayer film（max. HV（0.01） 41 GPa） is higher than that of the CrN/（Ti, Al, Zr, Cr）N film. However, the adhesive force of the CrN/（Ti, Al, Zr, Cr）N bilayer film is superior to that of the（Ti, Al, Zr）N/（Ti, Al, Zr, Cr）N film（all 200 N）.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2016年第5期1320-1324,共5页
Rare Metal Materials and Engineering
基金
沈阳市科技计划(F14-231-1-19)
辽宁省自然科学基金(2014020096)
