摘要
采用直流磁控溅射法制备Ta/[(Fe89.6Co10.4)0.76 nm/Cu1.2 nm]25多层膜,X射线衍射试验结果表明,退火处理提高了薄膜的结晶度,退火温度达到550℃时,薄膜中发生Fe Co和Cu的相分离;AFM测试表明增加Ta缓冲层后可有效地降低薄膜的粗糙度;巨磁电阻(GMR)效应测量结果表明,随着退火温度的升高,样品的巨磁电阻效应呈现出先增大后减小的趋势,在350℃达到最大值-1.95%;薄膜的磁性饱和场随着退火温度的升高而变大,矫顽力亦增加,并在450℃时达到3.614×104A/m。
The samples of Ta/[（Fe89.6Co10.4）0.76 nm/Cu1.2 nm]25multilayer films have been prepared by a DC magneto controlled sputtering method. The XRD data indicates that annealing improves the crystallinity of the films, also the phase separation of Fe Co and Cu at 550 ℃. The AFM measurements indicate that the film particles evenly distributed, the lower surface roughness is observed. And giant magnetoresistance（GMR） measurements indicate that the value of GMR first increases and then decreases with the increasing annealing temperature and reaches the maximum of-1.95% at 350 ℃. The saturation field and coercivity of the samples increases with the annealing temperature increasing and reaches the maximum of 3.614×104A/m at 450 ℃.
出处
《电工材料》
CAS
2016年第3期11-14,19,共5页
Electrical Engineering Materials
关键词
(FeCo)/Cu多层膜
退火处理
巨磁电阻效应
电磁性能
（Fe Co）/Cu multilayer films
annealing treatment
giant magnetoresistance
electromagnetic properties
