摘要
亚分辨率辅助图形(Sub-Resolution-Assist-Feature,SRAF)是光刻工艺图形增强技术(Resolution Enhancement Technology,RET)中广泛应用的一种方法。本文设计实验在密集图形(线宽/距离比约1:1)外侧放置不同的SRAF,研究了SRAF对于密集图形内部线条成像的影响,通过实验数据总结和理论分析,提出了最佳的SRAF放置位置。此外,本文还设计了一种与设计图形线宽一样大小的SRAF,并比较了其与传统尺寸SRAF对密集图形内侧线条成像的影响。
Sub-Resolution-Assist-Feature（SRAF）plays more and more important role in the Resolution Enhancement Technology（RET）. In this paper, SRAF experiments were carried out to a 28 nm dense line pattern, the best SRAF placement location was recommended according to experiment and optical intensity analysis. Furthermore,SRAF with same width of design pattern was also studied.
出处
《中国集成电路》
2016年第5期53-58,共6页
China lntegrated Circuit
