摘要
Y2002-63234-67 0224675光刻缺陷综合监测方式=Comprehensive cost-effectivephoto defect monitoring strategy[会,英]/Peterson,I.& Stoller,M.//2001 IEEE International Symposium onSemiconductor Manufacturing.—67～70(E)Y2002-63234-75 0224676神经动态编程优化腐蚀时间控制设计=Optimal etchtime control design using neuro-dynamic programming[会,英]/Yang,L.& Si,J.//2001 IEEE InternationalSymposium on Semiconductor Manufacturing.
出处
《电子科技文摘》
2002年第2期27-28,共2页
Sci.& Tech.Abstract
