摘要
将真空蒸发沉积的Al膜 ,在一台高频等离子体辉光放电的装置中进行阳极氧化 ,得到了光学和电学性能稳定的Al2 O3 膜。Al膜表面氧化层结构是γ Al2 O3 ,在波长 30 0～ 70 0nm范围内折射率为 1 5 3～ 1 34。文章还对用不同方法制备的Al2 O3
Aluminum oxide superlayers,with stable optical and electrical properties,were grown in a high frequency oxygen plasma by anodic oxidation of the high purity aluminum film prepared by vacuum deposition.The optical and electrical properties of the superlayer were studied with X ray diffraction (XRD),X ray photoelectron spectroscopy (XPS) and ellipsometry.The results show that the refractive index of the oxide layer (γ Al 2O 3) varies between 1 53 and 1 34 in the wavelength range of 300 700 nm.The variations in the refractive indices of different samples grown by various techniques were discussed.
出处
《真空科学与技术》
CSCD
北大核心
2002年第4期303-306,共4页
Vacuum Science and Technology
基金
国家自然科学基金 (No .5 9972 0 0 1)
安徽省自然科学基金
安徽省教育厅科研基金 (No .99JL0 0 2 4)资助项目
