摘要
在草酸盐、硅酸盐和磷酸盐电解液体系中,在钛合金Ti-6Al-4V(TC4)表面制备阳极氧化TiO_2膜层,研究了TiO_2膜层的表面显微结构、化学组成和生物活性。在室温用恒压阳极氧化法制备TC4表面阳极氧化TiO_2膜,以TC4为阳极,不锈钢为阴极,电解液组成为:20 g/L的Na_2C_2O_4、10 g/L的Na_2SiO_3·9H_2O、9.25 g/L的NaH_2PO_4和2 g/L的NaOH,阳极氧化电压为10-120 V,氧化时间50 min,电源频率200 Hz。用XRD、AFM、SEM及XPS等手段分别测量了膜层的物相、三维形貌、氧化膜层表面的显微结构及化学组成。结果表明:氧化电压对TiO_2膜层的物相组成基本没有影响,氧化膜层呈非晶态TiO_2。当氧化电压为30 V时,TiO_2膜层表面由孔径1.3μm左右的孔和凸起颗粒组成的粗糙结构,随着氧化电压增加表面凸起颗粒逐渐减少,粗糙度降低,当氧化电压为100 V时场致溶解的作用使TiO_2膜层表面凸起颗粒不明显,TiO_2膜层表面的粗糙度低于TC4基体,表面孔径为240 nm。TC4阳极氧化TiO_2膜层表面的微纳米结构和大量的羟基—OH,有利于提高TiO_2膜层的生物活性和骨生长特性。
Anodic oxidation films of TiO_2 were prepared on titanium alloys Ti-6Al-4V(TC4) in an electrolyte system of oxalate, silicate and phosphate hybrid by means of anodic oxidation with TC4 as anode and stainless steel as cathode. Then the crystallographic structure, three-dimensional topography, microstructure and bioactivity of the prepared TiO_2 films were characterized by means of X-ray diffractometer,X-ray photoelectron spectroscopy, AFM and scanning electron microscope etc. The results show that the applied voltage has almost no effect on the crystal structure of TiO_2 films which are amorphous. There exist certain amount of pores and convex particles with ca.1.3 μm in diameter on the surface of rough TiO_2 film prepared by an applied voltage of 30 V. With the increasing applied voltage, the convex particles on TiO_2 films are slowly dismissed due to the field assisted dissolution. There are many nanopores of ca. 240 nm in diameter on the films without convex particles when the applied voltage is 100 V. There are manyhydroxyls and micro/nano structures on the surface of anodic oxidation films on TC4 titanium alloy, which is useful for the enhancement of bioactivities and bone growth characteristics of the formed TiO_2 oxide films.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
2015年第12期895-903,共9页
Chinese Journal of Materials Research
基金
国家自然科学基金51362017
云南省重大科技专项2012ZE008资助项目~~
关键词
无机非金属材料
TC4钛合金
阳极氧化
表面处理
Ti
O2膜层
inorganic non-metallic materials
TC4 titanium alloy
anodic oxidation
surface treat-ment
TiO2 oxide film