摘要
全自动硅片清洗设备电气控制是以PLC、触摸屏为核心实现硅片清洗的自动化。介绍了该设备在PLC控制方面的技术改进,包括对机械臂的运动控制方式、工艺适应性以及安全性能两个方面,大大提高了设备的稳定性及安全性。
The electrical control of the full-automatic wafer cleaning equipment is based on PLC and whalen touch screen as the core to realize the automation of silicon wafer cleaning. It mainly enpounds the cleaning equipment improvement in PLC control technology, including the motorial controller, the process adaptability and safety performance, greatly improve the stability and safety.
出处
《电子工业专用设备》
2015年第10期23-26,共4页
Equipment for Electronic Products Manufacturing
关键词
硅片清洗设备
技术改进
运动控制方式
工艺适应
安全性能
Wafer cleaning equipment
Technical improving
Motorial control mode
Processadaptability
Safety perfomance
