摘要
阴极电弧技术(cathode arc technology)具有真空蒸镀及溅射镀膜的优点,目前而言该技术还在被不断地研究与发展。文章介绍了阴极电弧技术及其特点,分析了该技术制备的Ti Al N与Ti Al Si N涂层的微观结构以及元素的存在形式,并举例说明该技术制备的Ti Al N与Ti Al Si N涂层的物理性能及其应用。
The cathode arc technology possesses the advantages of vacuum evaporation and sputtering coating, for now the technology are still being constantly researched and developed. This paper introduces the technique and characteristic of cathodic arc and analyzes TiAlSiN and TiAlSiN coatings microstructure and exsiting form of elements prepared by this technique, and illustrates the physical properties of the TiAlSiN and TiAlSiN coatings by this technique and their applications.
出处
《中国陶瓷》
CAS
CSCD
北大核心
2015年第11期15-19,共5页
China Ceramics
基金
上海市教委创新基金(12YZ160)
上海市联盟计划(L201203
L201308)
关键词
阴极电弧
物理气相沉积
硬度
热稳定性
微观结构
镀膜
Cathode arc
Physical vapor deposition
Hardness
Thermal stability
Microscopic structure
Coating
