摘要
采用反应磁控溅射法制备了Al0.3CrFe1.5MnNi0.5高熵合金氮化物薄膜,分析了不同氮气含量反应下薄膜的微观结构,并考察了薄膜的摩擦磨损性能。结果表明：溅射时氮含量（RN）为0%时,薄膜为体心立方结构,RN为10%时,氮化物镀层主相为面心立方CrN,且存在其他原子置换CrN的晶格中部分Cr原子而形成固溶体。RN达到15%时,薄膜形成非晶结构,随着RN的增大,薄膜非晶化趋势明显。RN为20%-30%时,氮气的固溶度逐渐达到饱和。高熵合金氮化物薄膜的摩擦系数较合金薄膜有明显提高,在磨耗过程中,能够有效阻止裂纹,抗摩擦磨损性能较合金薄膜均有不同程度的提高。
Al0.3CrFe1.5MnNi0.5 high entropy alloy nitride films were deposited using medium frequency magnetron sputtering. The microstructure and wear properties of the films were investigated under different nitrogen contents reaction. The results show that the alloy films are BCC when RN is 0%, and turn to FCC of CrN since RN becomes 10%. It becomes solid solution by other atom replacing the Cr in CrN. An amorphous phase is found since RN reaches 15%. With the increase of RN, the thin film amorphous tendency appears obviously, and the solubility of nitrogen reaches saturation while RN reaches 20%. The friction coefficient of the high entropy alloy nitride films is obviously improved compared with alloy films. In the wear process, the nitride films can effectively prevent the crack, antifriction and wear properties are improved compared with alloy films.
出处
《热加工工艺》
CSCD
北大核心
2015年第12期174-177,181,共5页
Hot Working Technology
基金
上海市教委科研创新计划项目(13ZZ143
15ZZ104)
上海市闵行区校合作项目(2013MH198)
上海市军民结合专项(2014)
大学生创新计划项目(G2-13DXSCX-040)
关键词
高熵合金
氮化物薄膜
磁控溅射
微观结构
摩擦磨损
high entropy alloy
nitride films
megnetron sputtering
microstructure
friction and wear performance
