摘要
利用聚焦磁光克尔效应(MOKE)研究了不同形状单元组成的坡莫合金图形化阵列的单个单元磁化过程,研究发现单元的形状对单元磁性有很大影响,主要是单元的退磁场和形状有很大关联。研究还发现矩形阵列单个单元的磁滞回线不但与其矩形比有关,与单元间隔和在阵列中的阵列位置也有关。矩形单元易磁化方向沿着其长边方向,而短边方向为难磁化方向,其形状磁各向异性随矩形比而增大。当阵列单元之间的间隔大于单元尺寸时,在阵列中单元的位置对磁性影响相对较少,基本与单个单元的磁性相同。当单元之间的间隔接近单元尺寸时,不同位置的单元的磁性表现出磁各向异性不同,表明单元间的磁相互作用对磁性产生影响。
An investigation on the local magnetization processes within patterned permalloy films was performed by means of focused magneto-optic Kerr effect（MOKE） measurements,from which local magnetic hysteresis loops of the individual elements are found to be dependent on the shape and separation between the individuals as well as the position in the array.For the rectangular elements,the easy magnetization axis is along the length of element and the hard axis is along width of element.The shape anisotroy increases with increasing the length to width aspect ratio.When the separation between elements is larger than the element size,positions of elements in the array are relatively less influential on the behaviour of the magnetic hysteresis loops which are just the contribution of an individual element.When the separation between elements is close to the element size,the magnetic anisotropy shown in the magnetic Kerr loops is affected by the element position indicating that the magnetic interaction should be taken into account.
出处
《量子电子学报》
CAS
CSCD
北大核心
2015年第4期492-497,共6页
Chinese Journal of Quantum Electronics
基金
国家自然科学基金(50171029
11364015)
江苏省自然科学基金(BK20141328)
海南省自然科学基金(114008)资助
关键词
激光物理
磁各向异性
聚焦磁光克尔效应
图形化阵列
化学湿蚀刻
laser physics
magnetic anisotropy
focused magneto-optic Kerr effect
patterned film
chemical wet etching
