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低介电常数聚酰亚胺多孔薄膜的制备 被引量:6

Preparation of Polyimide Porous Film with Low Dielectric Constant
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摘要 以3,3′,4,4′-联苯四甲酸二酐和4,4′-二氨基二苯醚为单体,以三聚氰胺为成孔剂,制得一种聚酰亚胺多孔薄膜,并对薄膜的微观结构、力学性能及介电常数等进行测试。结果表明:制备该聚酰亚胺多孔薄膜的成孔工艺简单可行,三聚氰胺成孔剂可用热水溶解的方法去除。多孔薄膜孔洞数量多,且分布比较均匀。薄膜的介电常数较低、力学性能良好、吸湿率较低。当三聚氰胺添加量分别为25%和40%时,聚酰亚胺多孔薄膜的介电常数分别为1.82和1.36,聚酰亚胺多孔薄膜的拉伸强度分别为86 MPa和74 MPa,断裂伸长率分别为15%和10%。 A polyimide porous film was prepared by using 3,3’,4,4’-biphenyltetracarboxylic dianhydride and 4,4’-diaminodiphenyl ether as monomer, melamine as pore-forming agent, and its microstructure, mechanical properties, and dielectric constant were tested. The results show that the pore-forming process of the polyimide porous film is simple and feasible, and the melamine can be dissolved by hot water. The porous films have a great number of pores and their distribution is uniform. And the porous poly-imide films have low dielectric constant, good mechnical properties, and low water absorption. When the melamine addition content is 25% and 40%, the dielectric constant of the porous polyimide film is 1.82 and 1.36, the tensile strength is 86 MPa and 74 MPa, and the elongation at break is 15% and 10%, respectively.
出处 《绝缘材料》 CAS 北大核心 2015年第4期14-16,20,共4页 Insulating Materials
基金 桂林电器科学研究院有限公司创新基金项目(12568)
关键词 聚酰亚胺 多孔薄膜 成孔剂 介电常数 polyimide porous film pore-forming agent dielectric constant
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