摘要
利用微波等离子体增强化学气相沉积(MPECVD)技术在镀有过渡层金属Mo的Al2O3陶瓷基底上制备了非晶碳/Mo2C复合薄膜,研究了基底预处理对所制备薄膜的场发射特性的影响。结果表明,在同一条件下利用金刚砂研磨处理的样品具有比较好的场发射特性,利用W20金刚砂处理后制备的样品具有最好的场发射特性,其开启电场低(0.74 V/μm),同一电场(2.59 V/μm)下场发射电流密度最大(12.7 A/cm2)而且发光点分布均匀。
Microwave plasma enhancement chemical vapor deposition method （MPECVD）was employed to fabricate amorphous carbon/Mo2C complex film on the Al2O3 substrate. The effect of substrate pretreatment on the field emission property was investi- gated. Results suggested that the sample prepared on the pretreatment substrate has better field emission property. Sample with the best field emission property was fabricated by the pretreatment substrate with corundum in W20. The turn-on voltage is the lowest （0.74 V/μm）. The highest field emission current （12.7 A/cm2）was obtained at the same field emission （2.59 V/μm）and the luminous points were uniformly distributed.
出处
《真空》
CAS
2015年第1期13-16,共4页
Vacuum
基金
河南省科技攻关项目(122102210099)
河南省教育厅项目(12B14007
12A140001)
关键词
场发射
衬底预处理
非晶碳/Mo2C
field emission
substrate pretreatment
amorphous carbon/Mo2C
