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W波段分布作用速调管电子光学系统的研究

Design of Electron Optics System of Distributed Interaction Klystron
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摘要 本文设计了W波段分布作用速调管高压缩比电子枪和均匀场永磁聚焦系统;分析了电子枪区瓷封边对枪区磁场以及电子注直流通过率的影响;分析了不同聚焦磁场下的电子枪区磁场,并进行了测试分析,获得和模拟相一致的结果;给出了电子枪区铁磁性材料的两种工程上的可行性解决方案,增大磁屏开孔方案和部分瓷封边替换方案,其中采用瓷封边部分替换方案可以获得高的电子枪面压缩比. The high compression rate electron gun and uniform magnetic focusing system,dedicated to the W-band extended interaction klystron(EIK), were designed. The negative effect of the ferromagnetic alloy,or kovar alloy used to weld ceramic to metals,on the magnetic field in the gun area and on the electron beam transition was investigated. The depen- dence of the magnetic field at the gun area on the focusing magnetic field was simulated with software SUPERFISH, and ex- perimentally evaluated. The simulated results were found to be in consistent with the measured data. In addition, two techni- cally feasible modifications of the design were proposed:one is to enlarge the hole of the soft-iron shielding pole;the other is to partially substitute stainless steel for ferromagnetic alloy. Fabricated with partial substitution scheme, the compression rate and electron beam diameter of the newly-developed electron gun reached 120 and 0.26 mm,respectively.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2014年第8期819-823,共5页 Chinese Journal of Vacuum Science and Technology
基金 国家自然科学基金项目(61172015 61222110 61062001)
关键词 W波段 高压缩比 电子光学 分布作用速调管 W-band, High compression rate, Electron optics, Distributed interaction klystron
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