摘要
利用三离子束辅助沉积设备 ,以离子束辅助沉积、磁控溅射和离子束辅助磁控溅射几种工艺在GCr15基体上沉积TiN薄膜。实验结果表明 :离子束辅助磁控溅射有效地提高了薄膜的硬度、耐磨性和耐蚀性 ,改善了膜基结合力。
Titanium nitride films were deposited by ion beam assisted deposition, magnetron sputtering and ion-beam assisted magnetron sputtering deposition on GCr15 and Si substrate. The structure and mechanical properties such as micro-hardness, bonding strength, wear resistance were studied as well as the corrosion resistance. The results show that the hardness, bonding strength and wear resistance of the titanium nitride films deposited by ion-beam assisted magnetron sputtering are increased greatly and the corrosion resistance of films is also improved.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2002年第3期205-208,共4页
Rare Metal Materials and Engineering
基金
国家自然科学基金资助项目 (5 99710 3 5 )
