摘要
利用离子束溅射沉积的方法在不同基片温度条件下制备了不同成分的Ti Ni贮氢薄膜 ,研究了其电化学贮氢性能。结果表明 :用离子束溅射沉积制备的Ti Ni薄膜的结构为非晶态 ,薄膜对基片的附着力较强 ,在冲放电循环 5 0次后仍为非晶态 ;在基片温度为 35 0℃时制备的薄膜的结构为晶态 ,在多次放电循环后呈现非晶化趋势 ;Ti Ni薄膜具有较高的电化学活性 ,晶化薄膜比非晶态薄膜的最大放电容量高 。
Ti Ni hydrogen storage thin films were prepared by ion beam sputtering with variant composition under different temperatures,and their electrochemical characterizations have been studied.Their X ray diffractive results indicate that the structures of the thin films prepared by ion beam sputtering are amorphous at room temperature and the films have tight adhesion to the substrate,that their structures are still amorphous after 50 cycles of charging and discharging.The structures of thin films deposited at 350℃ become crystalline,and their discharge capacity is greater than that of amorphous films,but the cycling stability is lower than that of amorphous films.
出处
《核聚变与等离子体物理》
CAS
CSCD
北大核心
2002年第2期122-124,共3页
Nuclear Fusion and Plasma Physics
