摘要
用努普(Knoop)压痕法测量了沉积在普通玻璃上的 ITO,SnO_2和非晶硅薄膜的硬度。在0.245N 负荷下测得它们的硬度分别是7232、7987和4929MPa。这些薄膜材料的硬度取决于薄膜制备方法和制备时的工艺条件,同时也与测量方法有关。不同衬底温度时沉积的非晶硅薄膜,其硬度随温度降低而减小,这与非晶硅薄膜中所含的氢的多少有关。
The hardness of amorphous silicon films deposited on common window glasshas been measured by using Knoop indentation method under a load of 0.245 N.The hardness values of ITO,SnO_2 and a-Si films are 7232,7987 and 49(?)9 MParespectively.The hardness of these films depends on not only measuring methods,but also processing methods.The hardness of a-Si films deposited at different tem-peratures is decreased with the decrease of temperatures of substrate.It is consideredthat this decrease depends on the amount of hydrogen included in a-Si films.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1991年第3期380-381,共2页
Journal of Inorganic Materials
关键词
ITO
SNO2
薄膜
非晶硅
硬度
Hardness of thin films
Knoop indentation
ITO films
SnO_2 films
Amorphous silicon
