摘要
利用介质阻挡放电原理 ,在自行研制的设备上进行了常压非平衡等离子体渗氮。研究表明 ,在等离子环境中 ,试样表面能迅速获得很深的渗层和白亮层 ,而电场外试样几乎无渗层。说明电场内气体电离率高 ,活性粒子浓度高。整个工艺过程操作简便 ,是一种很有发展前景的新工艺。
Using dielectric barrier discharge (DBD) effect,atmospheric pressure non equilibrium plasma nitriding is carried on at self made equipment.The test results show that in the discharging space,a thicker white layer and diffusion layer on the treated surface of sample has been found in short time,but no nitrided layer is found on the sample out of discharging space.It indicates that ionizing rate of gas in the electronic field is high and the activated particle concentration is high too.The whole process is simple and convenient,and possesses good prospects in the field of mechine building industry.
出处
《金属热处理》
CAS
CSCD
北大核心
2002年第1期12-14,共3页
Heat Treatment of Metals
基金
国家教委高等学校博士学科点专项科研基金 (970 1 51 0 2 )
