摘要
利用脉冲激光沉积技术制备出了掺氮和未掺氮的类金刚石薄膜。采用X射线衍射仪、喇曼光谱仪、扫描电镜观察了掺氮和未掺氮类金刚石薄膜的微结构和表面形貌。场发射实验表明,掺氮降低了类金刚石薄膜的阈值电场,提高了发射电流密度。
The Diamond-Like Carbon (DLC) film and Nitrogen-doped DLC(N-DLC) film are deposited on molybdenum coated ceramic substrate by using the pulsed laser deposition technique. The microstructure and morphology of the films are examined using X-ray diffraction, Raman spectroscopy and scanning electron microscopy. Field emission measurements are carried out by using the diode structure. The field emission measurements indicate that nitrogen doping can lower the turn-on field and increase the current density.
出处
《电子与信息学报》
EI
CSCD
北大核心
2001年第11期1246-1248,共3页
Journal of Electronics & Information Technology
基金
863计划新材料领域资助项目
关键词
类金刚石薄膜
场发射
掺氮
Pulsed laser deposition, Diamond-like carbon film, Electron field emission
