摘要
采用动态偏压和真空度控制方法 ,用真空电弧沉积技术制备Ti N涂层 ,研究了动态参数条件对膜层组织与性能的影响。结果表明 ,动态参数控制下沉积的膜层形态表现为层状分布特征 ,膜层具有较高的致密性和高的显微硬度 ,以及良好的耐磨性能。在低偏压或较低真空度沉积阶段 ,膜层组织主要为Ti2 N和TiN相 ,而在高偏压高真空度沉积阶段膜层组织主要是Ti2
The influence of dynamic bias voltage and vacuum on microstructure and properties of the coatings deposited by vacuum arc were studied.The results showed that the coatings deposited under control of dynamic parameters exhibited a lamellar structure with good compactibility and high microhardness and excellent wear resistance.The coatings consisted of Ti 2N and TiN at lower bias voltage of lower vacuum degree,while TiN at higher bias voltage or higher vacuum degree.
出处
《金属热处理》
CAS
CSCD
北大核心
2001年第8期15-16,23,共3页
Heat Treatment of Metals
基金
广东省高教厅基金项目 (970 0 32 )
关键词
真空电弧沉积
动态偏压
动态真空度
组织
性能
氮化钛涂层
vacuum arc deposition
Ti N coating
dynamic bias voltage
dynamic vacuum degree
microstructure and properties
