摘要
报道用常压化学汽相沉积 (APCVD)工艺制备 Ti Ox纳米光学薄膜的研究结果 ,分析衬底温度对薄膜结构及折射率的影响 ,讨论在抛光硅片及绒面硅片上制备的 Ti Ox薄膜光学减反射特性 。
This paper reports some investigation results of nanometer TiOx optical thin film prepared by atmospheric pressure chemical vapor deposition(APCVD),analyzes the influence of temperature on constructure and refractive index of TiOx,the antireflection characteristics of TiOx deposited on polished wafers and textured wafers are dicussed,the optimal process is proposed.
出处
《应用光学》
CAS
CSCD
2001年第5期43-45,共3页
Journal of Applied Optics
