摘要
提出了一种制作 12 8× 12 8球冠型GaAs凹折射微透镜阵列新的方法———曲率倒易法。扫描电子显微镜(SEM )显示微透镜阵列为表面轮廓清晰的凹球冠面阵列 ,表面探针测试结果显示阵列表面光滑、单元重复性好 ,其凹深为 1 2 6 8μm ,焦距为 - 35 2 0 4μm。
128×128 element GaAs microlenses array is fabricated by a new method, named curvature inversion method. Scanning electron microscopy observation shows that the microlenses array has distinct spherical and concave contour, and surface stylus measurement shows that the microlenses array has smooth surface and its elements are of the same size. The depth of concave spherical surface is 1.268 μm, and the focal length is -352.04 μm. The structural diagrams of photolithography mask pattern are given.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2001年第6期530-532,共3页
Chinese Journal of Lasers
基金
国防科技重点实验室基金资助项目 (99JS11.2 .0JW 0 5 0 5 )
关键词
凹微透镜阵列
氩离子束刻蚀
砷化镓
Arrays
Masks
Photolithography
Semiconducting gallium arsenide
Surface measurement
