摘要
本文利用高斯分解法对聚焦光学系统中非线性介质引起的光限幅效应进行了优化分析，首次讨论了远场和近场（焦平面上）几何排布下的光限幅效应和灵敏度，且详细地分析了远场情况光限幅效应与样品到小孔距离的关系．
The article takes optimum analysis for optical limiting effect caused by nonlinear media in the focusing optical system using Gauss analytical method. Optical limiting effect and its sensitivity are discussed firstly under geometric distribution of far field and near field (focal plane), and we also consider the dependency of optical limiting effect on the distance between sample and pinhole in detail firstly.
出处
《量子电子学报》
CAS
CSCD
北大核心
2001年第3期232-235,共4页
Chinese Journal of Quantum Electronics
关键词
聚焦系统
光限幅效应
光学
focusing system
optical limiting effect
