摘要
目的研究纳米金刚石薄膜生长掺硼的内在机理,实现对该过程的精确控制。方法采用微波等离子体化学气相沉积法,以氢气稀释的乙硼烷为硼源,进行纳米金刚石薄膜的生长过程掺硼实验,研究硼源浓度对掺硼纳米金刚石薄膜晶粒尺寸、表面粗糙度、表面电阻和表面硼原子浓度的影响。结果随着硼源浓度的增加,纳米金刚石薄膜的表面粗糙度和晶粒尺寸增大,表面电阻则先下降,而后趋于平衡。结论纳米金刚石薄膜掺硼后,表面电导性能可获得改善,表面粗糙度和晶粒尺寸则会增大。在700℃条件下掺硼15 min,最佳的硼源浓度(以硼烷占总气体流量的百分比计)为0.02%。
Objective In order to study the intrinsic mechanism of doping borane during the growth of nano-crystalline diamond films to achieve precise control of the process. Methods Nano-crystalline diamond （NCD） films were boron doped by the micro- wave plasma enhanced chemical vapor deposition （MPCVD） method using hydrogen diluted di-borane as boron source. The influ- ences of borane concentration on grain size, surface roughness, surface resistance and boron atom concentration of boron-doped NCD films were investigated. Results The surface roughness and grain size of nanoerystalline diamond fihns increased with increas- ing concentrations of boron source. The surface resistance first showed a downward trend with increasing boron concentrations, and then gradually reached equilibrium. Conclusion The results showed that doping of boron could improve the surface conductivity performance of nano-crystalline diamond films and increase its surface roughness and grain size. By comprehensive comparison, the optimal borane concentration was 0.02% under the doping condition of 700 ℃ and 15 min.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2014年第3期6-9,24,共5页
Surface Technology
基金
国家自然科学基金项目(11175137)
湖北省教育厅科学技术研究项目(Q20121501)
武汉工程大学科学研究基金(11111051)~~
关键词
纳米金刚石薄膜
掺硼
硼源浓度
化学气相沉积
nano-crystalline diamond film
doping boron
boron concentration
chemical vapor deposition
