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The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma

The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma
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摘要 A novel technique to generate high-density plasma-called inductively coupled plasma (ICP), enhanced capacitively coupled plasma (CCP)- is successfully developed. The plasma can be generated using different frequency configurations, such as ICP-enhanced single-frequency ca- pacitively coupled plasma (SFCCP) and dual-frequency capacitively coupled plasma (DFCCP). The characteristics of the plasma in the following frequency combinations are mainly investigated using a Langmuir probe, SFCCP (60 MHz), DFCCP (60 MHz, 13.56 MHz), SFCCP (60 MHz) and inductively coupled plasma (13.56 MHz), DFCCP (60 MHz, 13.56 MHz) and inductively coupled plasma (13.56 MHz). In this letter, the nitrogen and hydrogen mixture gas discharge charac- teristics of different configurations are studied. After the analysis, we can acquire the electron temperature and ion density. Then, the effect of inductively coupled discharge on SFCCP and DFCCP can be summarized. In our preliminary investigations, the main results can be given as follows. ICP can make the density of SFCCP increase and the distribution of the electron temper- ature in a radial direction more uniform. In addition, ICP not only can make the ion density of DFCCP increase, but also can improve the radial uniformity. F^rther experiments may be needed to clarify the mechanism. A novel technique to generate high-density plasma-called inductively coupled plasma (ICP), enhanced capacitively coupled plasma (CCP)- is successfully developed. The plasma can be generated using different frequency configurations, such as ICP-enhanced single-frequency ca- pacitively coupled plasma (SFCCP) and dual-frequency capacitively coupled plasma (DFCCP). The characteristics of the plasma in the following frequency combinations are mainly investigated using a Langmuir probe, SFCCP (60 MHz), DFCCP (60 MHz, 13.56 MHz), SFCCP (60 MHz) and inductively coupled plasma (13.56 MHz), DFCCP (60 MHz, 13.56 MHz) and inductively coupled plasma (13.56 MHz). In this letter, the nitrogen and hydrogen mixture gas discharge charac- teristics of different configurations are studied. After the analysis, we can acquire the electron temperature and ion density. Then, the effect of inductively coupled discharge on SFCCP and DFCCP can be summarized. In our preliminary investigations, the main results can be given as follows. ICP can make the density of SFCCP increase and the distribution of the electron temper- ature in a radial direction more uniform. In addition, ICP not only can make the ion density of DFCCP increase, but also can improve the radial uniformity. F^rther experiments may be needed to clarify the mechanism.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第4期352-355,共4页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(Nos.11075114,10975106) the Priority Academic Program Development of Jiangsu Higher Education Institutions of China
关键词 inductively coupled plasma capacitively coupled plasma ion density elec-tronic temperature inductively coupled plasma, capacitively coupled plasma, ion density, elec-tronic temperature
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  • 1Chen F F. 1995, Phys. Plasmas, 2:2164. 被引量:1
  • 2Li D X, Ja D M. 1999, Polymer Materials Science and Engineering, 15:172. 被引量:1
  • 3Yun Y I, Kim K S, Uhm S J. 2004, J. Adhesion Sci. Technol., 18:1279. 被引量:1
  • 4Chan C M, Ko T M, Hiraoka H. 1996, Surf. Sei. Rep., 24:2. 被引量:1
  • 5Schamberger P, Abes J, Gardella J, et al. 1994, Col- loids Surfaces B, 3:203. 被引量:1
  • 6Liston E M, Martinu L, Wertheimer M R, et al. 1993, J. Adhesion Sci. Technol., 7:1091. 被引量:1
  • 7Huang H W, Ye C, Xu Y J, et al. 2010, Plasma Science and Technology, 12:566. 被引量:1
  • 8Chan C M. 1994, Polymer Surface Modification and Characterization. Hanser Publisher, Munich. 被引量:1
  • 9Lee S D, Sarmadi M, Denes E, et al. 1997, Plasmas and Polymers, 2:177. 被引量:1
  • 10Dupont-Gillian C C, Adriaensen Y, Derclays P, et al. 2000, Langmuir, 16:8194. 被引量:1

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