摘要
简要回顾了聚焦离子束/扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征等材料表征,以及离子束直接刻蚀加工如光子晶体阵列器件原型加工、材料沉积加工如用于电学性能测试的四电极制作、指定点加工如原子力显微镜针尖修饰、三维加工、电子束曝光及其与聚焦离子束联合加工等纳米结构加工两方面,以些具体实例分类进行了介绍。针对限制其应用的些不利因素,如加工效率低、面积小、精度不足、加工损伤等问题,些新技术如新型离子源Plasma、He+/Ne+离子等与现有Ga+聚焦离子束系统配合将成为未来发展方向。
The applications of Focused Ion Beam （FIB） /Scanning Electron Microscopy （SEM） DualBeam system at National Center for Nanoscience and Technology for micro-nanofabrication and characterization of nanomaterial are briefly reviewed by means of a lot of typical practical examples. Regarding characterization of nanomaterial, the capabilities, such as TEM sample preparation, Scanning Ion Microscopy （SIM）, 2D and 3D characterization of nanomaterial, are illustra- ted. And as for micro-nanofabrication, the applications include ： （ 1 ） direct milling for nanostructures, for instance, pho-tonic array prototyping; （2） precise material deposition, for example, platinum metal deposition for four-electrode meas-urement; （ 3 ） site specific fabrication, such as AFM tip modification ; （ 4 ） 3 D nanofabrication ; （ 5 ） electron beam lithog-raphy （EBL） and its combination with FIB. The application fields of DualBeam system involve material science, electron-ics, life science and natural resources. To extend the application field, a number of new technologies, including various new types ion source, such as plasma, He^＋ and Ne^ ＋ are expected to be used in the near future to overcome some present disadvantages, for instance, low productivity, small fabrication area, bad fabrication precision, FIB induced damage and SO OH.
出处
《中国材料进展》
CAS
CSCD
2013年第12期728-734,751,共8页
Materials China
关键词
聚焦离子束
双束系统
纳米材料表征
纳米结构加工
电子束曝光
透射电镜样品制备
focused ion beam （FIB）
dual beam system
micro-nanofabrication
nanocharacterizatiou
electron beamlithography （EBL）
TEM sample preparation
