期刊文献+

V_(In)H_4在InP材料中的影响 被引量:1

Influences of hydrogen vacancy complex V_(In) H_4 in N-Type LEC InP
原文传递
导出
摘要 在未掺杂和掺Fe的LEC In中用FT IR测试到VInH4 的存在。已经证实该缺陷在LEC -InP中普遍存在。经研究表明在掺Fe的InP中的VInH4 浓度比在未掺杂中的高。而在同一晶锭中其浓度分布是头部高 ,尾部低。讨论了其对未掺杂InP的电子特性和掺Fe的InP的补偿的影响 ,及其对InP热稳定性的影响。 A hydrogen indium vacancy comples V In H 4 in undoped and Fe doped liquid encapsulated Czochralski (LEC) InP is measured by infrared absorption spectroscopy. This complex is found to be a common defect in as grown LEC InP. The concentration of V In H 4 in Fe doped InP is higher than that of undoped InP. The concentration of V In H 4 is high in wafers from the top of an ingot and low from the tail of an ingot. The influence of this complex on the electrical properties of n type LEC undoped and compensation in Fe doped InP is discussed. The results reveal the influence of V In H 4 on the thermal stability of InP materials due to the fact that bond of hydrogen complex is weak and dissociates easily upon annealing.
出处 《功能材料与器件学报》 CAS CSCD 2000年第4期316-320,共5页 Journal of Functional Materials and Devices
关键词 INP VInH4 掺杂 磷化铟 电子特性 热稳定性 InP Hydrogen complex Compensation
  • 相关文献

参考文献5

  • 1Zhao Y W,Appl Phys Lett,1999年,72卷,2126页 被引量:1
  • 2Fung S,J Appl Phys,1999年,86卷,2361页 被引量:1
  • 3Fung S,J Appl Phys,1999年,86卷,951页 被引量:1
  • 4Zhao Y W,J Appl Phys,1999年,86卷,981页 被引量:1
  • 5Fung S,Appl Phys Lett,1998年,73卷,12页 被引量:1

同被引文献14

  • 1孙聂枫,周晓龙,陈秉克,孙同年.InP单晶材料现状与展望[J].电子工业专用设备,2005,34(10):10-14. 被引量:10
  • 2杨勋,戴剑,王世超,邓爱红.非掺杂半绝缘态InP中补偿缺陷正电子寿命谱的研究[J].四川大学学报(自然科学版),2006,43(1):129-133. 被引量:1
  • 3Dr adarsh sandhu. Monitoring eyes on indium phosphide [J]. Ⅲ - Vs REVIEW,2004,17(5) :31 -33. 被引量:1
  • 4Sun Fung, Zhao Youwen, Sun Niefeng et al. H - vacancy complex VInH4 abundance and its influences in n - type LEC InP[J]. Journal of crystal growth 2000,211:174 - 178. 被引量:1
  • 5Hirt G, Wolf D, Mller G. Quantitative study of the contribution of deep and shallow levels to the compensation mechanisms in annealed InP [ J ]. J ApplPhys, 1993 (74) :5538 - 5545. 被引量:1
  • 6Fornari R, Gilioli E, Sentiri A et al. Homogeneity of thermally annealed Fe - doped InP wafers [ J ]. Materials science and engineering : B, 1997,44 ( 1 - 3 ) : 233 - 237. 被引量:1
  • 7Zhao Y W, Xu X L, Gong Met al. Formation of Pin defect in annealed undoped LEC InP [ J ]. Appl Phys Lett, 1998(72) :2126 - 2128. 被引量:1
  • 8Zhao Youwen, Dong Hongwei, Jiao Jinghua et al. Preparation of Semi - Insulating Material by Annealing Undoped InP[ J].半导体学报,2002,23(3):285-289. 被引量:1
  • 9Gail Purvis. The idiom of InP [ J ].Ⅲ - V s REVIEW, 2004,17 (3 ):35 -38. 被引量:1
  • 10赵有文,苗杉杉,董志远,吕小红,邓爱红,杨俊,王博.磷化铟中铁原子替位与填隙的热致转变及其对材料性质的影响[J].物理学报,2007,56(9):5536-5541. 被引量:2

引证文献1

二级引证文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部