摘要
薄膜溅射过程中杂质污染问题是影响薄膜质量的重要因素,会造成薄膜的吸收和散射损耗增大、结合力下降,形成针孔等。采用射频磁控溅射沉积氧化铝薄膜时,发现在不同负偏压条件下,真空室内的金属离子会造成不同程度薄膜污染,采用XPS对污染物进行了测试表征,并对污染来源进行了分析,最后得出结论:在较高负偏压条件下真空室器壁金属溅射,是造成镀制氧化铝薄膜的重要污染源。
Coating contamination caused by the coating process itself is a key problem which can lead to absorption,scatting,pinholes,adhesion failure.In this paper,alumina coating is deposited by RF magnetron sputtering under deferent minus bias voltage,coating contamination in different degree is found.The contaminants are characterized by XPS,and the source of coating contaminants is analyzed.At last,a conclusion is drawn,that the important source is the metal particles sputtered from the coating vacuum chamber in high minus bias voltage.
出处
《长春理工大学学报（自然科学版）》
2013年第3期63-64,94,共3页
Journal of Changchun University of Science and Technology(Natural Science Edition)
基金
中国科学院大连化学物理研究所创新基金项目(K2010B1)
关键词
射频磁控溅射
氧化铝薄膜
偏压
薄膜污染
RF magnetron sputter
alumina coating
bias voltage
coating contamination
