摘要
为优化电沉积镀镍工艺,通过两组正交实验,分别确定在垂直方向磁场和平行方向磁场作用下各工艺参数对镀镍层的显微硬度、晶粒尺寸和表面形貌的影响作用。分析结果发现,磁场不是决定电沉积工艺的主导影响因素,电流密度和超声功率对电沉积的影响作用较大,平行磁场相较于垂直磁场更有利于镀层晶粒的生长,最后找出最佳电沉积工艺参数为:电流密度2A/dm2、超声功率240W、平行磁场方向、磁感应强度0.6T、占空比20%,并分析形成这种结果可能的机理。
In order to optimize the electrodeposited nickel plating process,through two sets of orthogonal experiment,it determines the effect of various process parameters on the hardness,grain size and surface morphology of the nickel plating layer under the vertical magnetic field and parallel magnetic field.Analysis results revealed that the magnetic field is not the dominant influencing factor of the electrodeposition process,since the current density and ultrasonic power show greater impacts on the electrodeposition.Parallel magnetic field is more conducive to the growth of coating grain compared with the vertical magnetic field,and finally it finds the best electrodeposition process parameters： current density 2A/dm2,ultrasonic power 240W,parallel magnetic field direction,the magnetic induction intensity 0.6T,duty cycle 20%,and it analyzes the possible mechanism of this result.
出处
《机械设计与制造》
北大核心
2013年第7期144-146,共3页
Machinery Design & Manufacture
基金
国家自然科学基金项目(50975034)
辽宁省科技计划项目(2010223006)
关键词
磁场
电沉积
显微硬度
晶粒尺寸
表面形貌
Magnetic Field
Electrodeposition
Microhardness
Grain Size
Surface Morphology
