摘要
以脉冲激光沉积(PLD)的CNx材料为靶源,以单晶Si片为衬底,在N2气压为2～11Pa下PLD制备了CNx薄膜。采用X射线光电子能谱(XPS)、拉曼(Raman)光谱、扫描电子显微镜(SEM)和球盘式摩擦磨损试验机分别对薄膜的化学成分、价键状态、表面形貌和摩擦性能进行了表征。结果表明:低沉积气压导致薄膜N含量的退化及耐磨性能的下降;沉积气压介于5～8Pa时最利于sp3杂化键的形成,且薄膜的N含量缓慢下降,膜中比值xsp2/xsp3和ID/IG均减小,xsp2C-N/xsp3C-N增加并趋于恒定,薄膜的耐磨性较好(约2.7～4.3×10-15 m3.N-1.m-1),但摩擦系数相对较高(约0.24～0.25);过高的气压导致膜层中N含量的下降和石墨化程度的增加,薄膜摩擦系数较低(约0.19),但耐磨性呈下降趋势。
The CNχ films were deposited on monocrystal silicon substrates by pulsed laser ablation of CNχ target under the nitrogen gas pressure ranging from 2 Pa to 11 Pa. The chemical composition, bonding properties and surface morphology of the CNχ films are investigated by X-ray photoelectron spectroscopy （XPS）, Raman spectroscopy and scanning electron microscopy （SEM）, respectively. Meanwhile, the tribological properties of the films are tested by using a ball-on-disk tribometer. The results show that low deposition pressure could degrade the nitrogen content and wear resistance of the pulse laser deposited CNχ films. In the range of deposition pressure from 5 Pa to 8 Pa,it is good for the formation of the sp^3 hybrid bonding but the nitrogen content decreases gradually. A decreased ratio of χsp^2/χsp^3 and ID/IG, an increased ratio of χsp^2C-N/χsp^3-N and a good wear resistance at the order of （2.7-4. 3） ×10^-15 · m^3 · N^-1 · m^-1 but a higher friction coefficient about 0. 24-0. 25 are observed under the deposition pressure ranging from 5 Pa to 8 Pa. Further increase in deposition pressure leads to the decrease of N content and an increased degree of graphitization, the friction coefficient of the film is around 0.19, and a worse wear resistance is found.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2013年第6期1126-1132,共7页
Journal of Optoelectronics·Laser
基金
浙江省自然科学基金(Y4110645)资助项目
