摘要
介绍了离子束加工技术在半导体工艺中的应用以及离子束刻蚀机的真空和控制系统、Veeco直流栅极离子源及其电源MPS-5001的结构和工作原理、PBN中和器的原理和作用。介绍了离子源电源参数的调整技巧及需要注意的问题,在此基础上给出了离子源常见故障现象的原因及解决办法。
The appliacation of ion beam technology in semiconductor process device is introduced.The vacumm system and control system in ion beam etching are explained.The analysis of the construction and principle of Vecco DC grid ion source and its power supply MPS 5001 is given.The principle and fuction of PBN are explained.The skill and attention in ion source power supply parameter adjustment is introduced,then the fault and the cause and the troubleshooting are listed.
出处
《电子工业专用设备》
2013年第5期58-61,共4页
Equipment for Electronic Products Manufacturing
