摘要
氡气在主辅氡箱氡室中是一种动态稳定状态,论文首先讨论主辅氡箱中氡活度的积累规律,通过对主辅氡箱同时进行补氡控制过程的仿真及采用实验方法验证主辅氡箱的补氡过程,验证了一个氡源两个箱体氡室氡浓度补氡控制的可行性,并取得了比较好的效果。
The Radon gas in the primary and secondary Radon chamber is in a dynamic steady state. The paper discusses the activity in the accumulation of radon in primary and secondary radon chambers first, then has verified the feasibility of radon concentration control of two radon chambers from one radon source and achieves relatively good results by using the simulation of radon decay and the process of adding radon to the primary and secondary radon chambers. An experiment is carried out to verify this process and the result is satisfactory.
出处
《核电子学与探测技术》
CAS
CSCD
北大核心
2013年第3期376-378,共3页
Nuclear Electronics & Detection Technology
基金
湖北科技学院青年项目(KY12044)
关键词
氡室
氡浓度
主辅氡箱
仿真
radon chamber
radon concentration
primary and secondary radon chamber
simulation
