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超高真空化学气相沉积外延生长锗硅材料及其应用

Applications and Epitaxial Growth of Silicon-Germanium Films by Ultra High Vacuum Chemical Vapor Deposition
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摘要 综述了硅基锗硅薄膜的外延生长技术、设备及其在光电子器件上的应用,其中着重介绍了超高真空化学气相沉积系统(UHVCVD)。目前来说,UHVCVD是产业化制备高质量锗硅材料的最佳选择。 Epitaxial growth techniques and applications in optoelectronics of germanium-silicon films on silicon substrates were reviewed. Equipments for fabricating films, especially ultra high vacuum chemical vapor deposition (UHVCVD) system, were introduced. Up to now, UHVCVD is thought to be the most suitable equipment for industry high throughput production.
作者 赵瓛 张彬庭
出处 《电子工业专用设备》 2013年第4期1-8,23,共9页 Equipment for Electronic Products Manufacturing
关键词 锗硅 外延生长 超高真空化学气相沉积 silicon-germanium epitaxial growth Ultra High Vacuum Chemical Vapor Deposition
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