摘要
针对大面积且高密度PCB光刻,利用ZEMAX光学设计软件,设计了一种8片式光刻投影物镜。该物镜采用对称双高斯结构,放大倍率为-1,数值孔径NA=0.06,单次曝光面积Φ=80mm,具有优于7μm的分辨力和120μm的焦深。通过对该镜头进行公差分析,表明最紧公差为部分元件倾斜要小于0.017°。用MonteCarlo方法模拟了制造50组镜头的成像质量,得到在空间频率72line/mm处,90%的镜头的MTF>0.58,因此加工装配时能保证90%以上的成品率。
For large-area and high-density Printed Circuit Board （PCB） lithography, we use ZEMAX optical design soRware to design a kind of lithographic projection lens with 8 optics element. Symmetrical double Gaussian structure is applied in the lens, the magnification is -1, and numerical aperture NA = 0.06. It can exposure a area ofФ= 80 mm at a time, and have better than 7 pm resolution and 120 grn focus shift. The result of tolerance analysis show that the tightest tolerance is part of the element tilts, which should be lower than 0.017 o. We use the Monte Carlo method to simulate fabricating and assembling 50 group of lens. The results show 90% of the lens MTF 〉 0.58 at spatial frequency 72 line/mm, which can ensure more than 90% yield when they are fabricated and assembled.
出处
《光电工程》
CAS
CSCD
北大核心
2013年第2期100-104,共5页
Opto-Electronic Engineering
基金
国家自然科学基金资助项目(60977029)
国家自然科学基金青年基金(61107029)
广东工业大学重大项目培育专项(092010)
