摘要
通过对磁控溅射氧化锡镀膜工艺的研究,指出在不同溅射功率、不同工艺气体流量下,如何稳定、高效地控制氧化锡磁控溅射镀膜工艺。
This article discussed the tin oxide coating technique with magnetron sputtering process in order to make the process steadiness and high efficiency under different sputtering power and gas flow rate through the research on tin oxide coating technology.
出处
《玻璃》
2013年第2期27-33,共7页
Glass
关键词
磁控溅射
氧化锡
气体流量
阴极电压
magnetron sputtering, tin oxide, gas flow, cathode voltage
