摘要
分析了EI-5Z型电子束镀膜机膜厚控制的特点。借助试验结果和理论研究,重新设计了更具实用性的调整板,得到了更好的薄膜性能:基片内偏差在±3%范围内,同一批次基片之间偏差在±5%范围内。满足了批量生产的要求。
Study the fihn unirmity characteristics of EI-SZ eleclron beam coater.By use of the experimental resuhs and theoretical study, the correction masks with practicability was redesigned, obtaining better deposition performance, ＋ 3% in a substrate and ＋ 5% in the same batch.This meets the mass production demands.
出处
《真空》
CAS
2012年第5期49-52,共4页
Vacuum
关键词
薄膜均匀性
调整板
批量生产
film uniformity
correetion mask
mass production
