摘要
采用辉光放电质谱法(GD-MS)测定高纯钛中Mg、Al、Cr、Fe、V、Mn、Co、Ni、Cu、Zn、As、Sn、Sb、Ta、W、Pb、Bi等痕量杂质元素,并对GD-MS工作参数及条件进行了优化。主要元素与内标校正ICP-MS法定量分析的结果一致,对结果差异的原因进行分析,论述了Element GD辉光放电质谱仪在痕量杂质元素分析方面的优势。
A new method for the determination of trace amounts of elements Mg,Al,Cr,Fe,V,Mn,Co,Ni,Cu,Zn,As,Sn,Sb,Ta,W,Pb,Bi in high-purity titanium by GD-MS was developed,and GD-MS operating parameters and conditions were optimized.The concentrations of main metal impurities are in good agreement with those determined by ICP-MS.An analysis on the distinction of results was taken,and the advantage of the element GD-MS in trace analysis of impurity elements was discussed.
出处
《分析试验室》
CAS
CSCD
北大核心
2012年第7期9-12,共4页
Chinese Journal of Analysis Laboratory
基金
国家科技支撑计划项目(2006BAF07B03)资助
