摘要
应用恒电位稳态极化和交流阻抗技术研究了希夫碱—邻香兰素邻苯二胺 (V_oPh_V)在中性NaCl或NaBr溶液中对金属铜阳极溶解和腐蚀的缓蚀作用 .通过比较铜在空白溶液与含有V_o_Ph_V溶液中的电化学行为解释了V_o_Ph_V的缓蚀机制 .此外还研究了V_o_Ph_V自组装膜在Na Cl溶液中对铜腐蚀的缓蚀效应 .
Inhibition of N,N'_o_phenylen_bis(3_methoxysalicylidenimine)(V_o_Ph_V)on corrosion and anodic disslution of copper in neutral NaCl and NaBr solutions was investigated in terms of potentiostatic steady_state polarization and A.C. impedance techniques.The inhibition mechanism of V_o_Ph_V to copper corrosion was interpreted in detail by comparing the electrochemical behaviors of copper in halide solutions with or without V_o_Ph_V. Besides,the inhibition effect of self_assembled V_o_Ph_V film on copper corrosion in NaCl was also studied.
出处
《电化学》
CAS
CSCD
2000年第1期31-39,共9页
Journal of Electrochemistry
基金
国家重点基础研究专项经费资助!G19990 6 5 0
金属腐蚀与防护国家重点实验室资助
关键词
V-o-Ph-V
缓蚀
铜
铜合金
腐蚀
电化学保护
N,N'_o_phenylen_bis(3_methoxysalicylidenimine)(V_o_Ph_V),A.C.impedance,self_assembled film,inhibition
