摘要
采用直流磁控溅射法,以P型单晶硅为基体材料,通过调整溅射时间制备出不同厚度的NdFeB薄膜。然后对不同厚度的薄膜运用相关仪器进行表征,结果表明,NdFeB薄膜厚度随着溅射时间的延长呈现近似线性增加,不同溅射时间段的沉积速率近似相同。矫顽力随着薄膜的厚度和Nd含量的增加而增加,薄膜中F的含量由84.01%降至81.65%,Nd含量由10.73%升至13.10%,B含量在5.25%～5.38%范围内浮动。
Magnetron sputtering was used to prepare different thickness of the NdFeB thin fihns with single crystal silicon substrate material for P type by adjusting sputtering time. Then, the NdFeB thin films with different thickness were characterized by the relevant instuments. The results show that the deposition thicknesses of the Nd- FeB thin films increased linearly with the increasing of sputtering time, the deposition rate was approximately equal to different periods of the sputtering time. The coercive force increased gradually with the increasing of films thickness and the content of Nd. In the films, the content of Fe decreased from 84. 01% to 81. 65% and Nd increased from 10. 730/00 to 13.10%,the content of B floated between 5.25% and 5.38%.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2012年第10期46-48,69,共4页
Materials Reports
基金
山西省自然科学基金(2008011042-2)
关键词
磁控溅射
NdFeB薄膜
表面形貌
磁性能
magnetron sputtering, NdFeB thin film, surface morphology, magnetic properties
