摘要
采用俄罗斯UVN 0.5D2I脉冲离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiAlN膜层。研究了膜层沉积之前N离子束轰击基材以及膜层沉积过程中N离子束辅助轰击对TiAlN膜层显微硬度的影响。结果表明:膜层沉积之前,N离子轰击得到高度洁净的表面,使基材的显微硬度由原来的900HV0.01提高到1230HV0.01。膜层沉积过程中,脉冲N离子束轰击,消除了膜层中的硬度"软点"及阴影效应,增加(Ti,Al)N相的含量,膜层的内部产生了压应力,这些因素显著提高了膜层的硬度,膜层的最高硬度为2530HV0.01。但轰击能量不能过高,否则会降低膜层的显微硬度。
TiAlN coatings were deposited on high-speed steel W18Cr4V substrate by Russia UVN 0.5D2I ion beam assisted arc ion plating device.The effects of N ion beam bombarding before and during deposition on micro hardness of TiAIN coatings were studied.The highly clean surface was formed by N ion beam bombarding before coatings deposition,which increased the micro hardness of matrix from 900HV0.01 to 1230HV0.01.The ＂soft point＂ of hardness in coatings and the shadow effect were eliminated by N ion beam bombarding during coatings deposition.The content of（Ti,Al）N phase was increased and the compressive stress was produced in coatings.These factors increased the hardness of coatings significantly.The highest hardness value is 2530HV0.01.But the bombardment energy can not be too high.Otherwise,the hardness of coatings will be decreased.
出处
《沈阳理工大学学报》
CAS
2012年第1期5-8,共4页
Journal of Shenyang Ligong University
基金
科技部国际合作重点项目(2009DFA4800)
