摘要
为优化免洗小米抛光工艺,在单因素试验基础上,选择上光剂的浓度、温度和添加量为自变量,洗米水的浊度为响应值,根据中心组合试验设计原理采用3因素3水平响应面分析法,模拟得到二次多项式回归方程预测模型,并确定免洗小米抛光的最佳工艺条件为:浓度30%、温度30℃、添加量1%,浊度为54.8NTU。
In order to optimize the polishing techno factor experiment ,this paper chooses concentration ogy of washing free millet, according to the single temperature and additive amount as for variables. A series of central composite design experiments were conducted for developing a mathematical regression model for turbidity of wished millet as a response of three variables. Besides based on this, response surface and contour plots were drawn for analyzing the interactive effects of the above variables on turbidity. Results indicated that the optimal extraction process was obtained as follows：concentration 30%,temperature 30 ℃, additive amount 1%, which resulted in turbidity was 54.8NTU.
出处
《食品科技》
CAS
北大核心
2012年第3期168-171,共4页
Food Science and Technology
关键词
免洗小米
抛光
浊度
washing free millet
polish
turbidity
