摘要
We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Q_s,δ_p/δ_n and D_（it）.The polarity of the dielectric film is very important to the illustration level dependent passivation quality;when nδ_n = pδ_p and the defect level E_t equal to E_i（c-Si）,the defect states are the most effective recombination center,AFORS-HET simulation and analysis indicate that emitter doping and a-Si/c-Si band offset modulation are effective in depleting or accumulating one charged carrier.Interface states（D_（it）） severely deteriorate V_（oc） compared with J_（sc） for a-Si/c-Si HJ cell performance when D_（it） is over 1×10^（10） cm^（-2）·eV^（-1）.For a c-Si（P）/a-Si（P~＋） structure,φ_（BSF） in c-Si andφ_0 in a-Si have different performances in optimization contact resistance and c-Si（P）/a-Si（P~＋） interface recombination.
We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Q_s,δ_p/δ_n and D_（it）.The polarity of the dielectric film is very important to the illustration level dependent passivation quality;when nδ_n = pδ_p and the defect level E_t equal to E_i（c-Si）,the defect states are the most effective recombination center,AFORS-HET simulation and analysis indicate that emitter doping and a-Si/c-Si band offset modulation are effective in depleting or accumulating one charged carrier.Interface states（D_（it）） severely deteriorate V_（oc） compared with J_（sc） for a-Si/c-Si HJ cell performance when D_（it） is over 1×10^（10） cm^（-2）·eV^（-1）.For a c-Si（P）/a-Si（P~＋） structure,φ_（BSF） in c-Si andφ_0 in a-Si have different performances in optimization contact resistance and c-Si（P）/a-Si（P~＋） interface recombination.
基金
Project supported by the International Joint Foundation of Shanghai Science & Technology Commission with Applied Material,China(No. 08520741400)
the Talent Foundation of Shanghai Science & Technology Commission,China(No.08XD14022)
