期刊文献+

Ni/NiO交换偏置系统的制备与测试

Manufacture and testing of Ni/NiO exchange bias system
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摘要 将具有60keV能量的O离子注入通过分子外延束方法生长的Ni铁磁性薄膜,再将注入离子与基质原子发生化学反应所生成的反铁磁性NiO颗粒镶嵌于铁磁性薄膜中,在Ni/NiO界面处通过交换相互作用构建起交换偏置系统,在对系统进行场冷后,成功测量到磁滞回线的平移,在此基础上研究了系统的微观结构和磁特性,并对其中交换偏置的来源做出初步解释.通过调制注入离子的剂量,系统研究了不同因素对交换偏置的影响,优化了交换偏置系统的制备方法. Oxygen ions with 60 keV in energy are implanted into ferromagnetic Ni films used MBE (molecular-beam epitaxy), and the anti-ferromagnetic NiO particles formed by the reaction of the implanted ions with matrix atoms are embedded in home matrix. According to exchange interaction between interlayer of AFM particles and FM ma- trix, the exchange bias structure is built. The hysteresis loops are measured after field cooling, and the structure and magnetic property of the Ni/NiO exchange bias system are investigated based on it. Based on the investigation, the preliminary explanation of the origin of the exchange bias effect in them is given. The effects of different conditions on the system are investigated by modulating the dose of the implanted ions, and the manufacture is optimized.
作者 丁斌峰 法涛
出处 《天津师范大学学报(自然科学版)》 CAS 2012年第1期26-30,共5页 Journal of Tianjin Normal University:Natural Science Edition
基金 国家重点基础研究发展计划(973)资助项目(2010CB832904) 国家自然科学基金资助项目(10875007 11005005) 廊坊师范学院重点资助项目(LSZZ201101)
关键词 交换偏置 离子束技术 界面相互作用 exchange bias technology of ion beam interaction between interlayer
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