摘要
背景:上颌窦黏膜形变温和均匀是减少骨挤压式上颌窦提升手术中黏膜穿孔的重要因素。目的:比较两种直径种植体对上颌窦黏膜形变的影响。方法:在ANSYS有限元软件的特定单元中分别建立直径4.1mm和4.8mm的ITI种植体与厚0.3mm的上颌窦黏膜的有限元模型,模拟上颌窦提升手术抬高黏膜,根据大变形理论计算不同提升高度黏膜表面Vonmises应力值。结果与结论:结果显示,最大Vonmise应力发生在黏膜中心,最小Vonmise应力发生在黏膜边缘。两种直径种植体对黏膜中心作用力差异无显著性意义(P>0.05),而对黏膜边缘作用力,直径4.8mm种植体较4.1mm种植体具有更加均匀温和的作用力。因此,在骨宽度允许的情况下,直径4.8mm的种植体更适合用于骨挤压式上颌窦提升手术。
BACKGROUND： Mild and uniform deformation of maxillary sinus mucosa is an important factor that reduces the incidence of mucosal perforation during maxillary sinus elevation by using bone condensing technology. OBJECTIVE： To compare the effects of two diameter implants on the deformation of maxillary sinus mucosa. METHODS： Three-dimensional finite element models of the maxillary sinus mucosa （thickness 0.3 mm） with two diameter implants （4.1 mm, 4.8 mm） were established in the special unit of ANSYS software. Maxillary sinus elevation operation was simulated. Von Mises stress values of mucosa surface with different lifting height was calculated according to the finite deformation theory. RESULTS AND CONCLUSION： The maximum stresses of all models existed in the center of the mucosa and the minimum stresses existed in the edge of the mucosa. There was no significant difference in the stress to the center of the mucosa between the two diameter implants （P 0.05）, but the stress in the edge of mucosa of the larger diameter implant （4.8 mm） was significantly less than that of the stress in the edge of the small diameter implant （4.1 mm）. The larger diameter implant （4.8 mm） has less stress for augmentation of the maxillary sinus floor in the case of allowed width.
出处
《中国组织工程研究与临床康复》
CAS
CSCD
北大核心
2011年第52期9742-9745,共4页
Journal of Clinical Rehabilitative Tissue Engineering Research
基金
广东省医学科研课题资助(A2009095)
课题名称:骨挤压式上颌窦提升术的计算机力学分析研究~~
