摘要
采用硫酸甲醇体系对钽进行电解抛光,并对其抛光性能进行了研究,测定了不同配比时电解液中钽的阳极极化曲线,研究了电解液配比和电压对钽表面质量的影响。在搅拌速率为16m/s、电解液温度为0℃、时间为3min、硫酸甲醇体积比为1:7时,电压在20V左右抛光效果较好、钽表面均方根粗糙度Rq小于30nm,不仅能够满足钽材表面精饰加工需求,而且能够满足EOS靶用标准材料薄膜对表面质量要求。
Sulfuric acid-methanol electrolytes were applied for the electropolishing of tantalum. The effects of electrolyte composition and voltage on the finish quality of tantalum were investigated. The optimum parameters for polishing tantalum are determined as follows： V（H2SOa）：V（CH3OH） =1：7, voltage=-20 V when the stir speed is 16 m/s, and the electrolysis time is 3 min at 0 ℃. The results show that RMS Rq of the polished tantalum is less than 30 nm and the requirement of tantalum surface and EOS thin film can be satisfied.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2011年第12期2184-2187,共4页
Rare Metal Materials and Engineering
关键词
钽
电解抛光
表面粗糙度
tantalum
electropolishing
roughness
