摘要
采用粉末包埋法对电子束物理气相(EB-PVD)制备钛合金薄板在620℃分别进行6h渗铝及铝硅共渗,采用XRD、SEM等对EB-PVD制备钛合金薄板显微组织以及粉末包埋法渗铝及Al-Si共渗后的钛合金薄板显微组织结构进行研究。结果表明,微晶合金可以在620℃实现渗铝和铝硅共渗。渗铝层的相结构主要为Al3Ti相,但由于渗层Al3Ti相为脆性相,在渗后冷却过程中热应力的作用下,易产生裂纹。铝硅共渗层的相结构主要为Al3Ti和Ti5Si3相,由于Si存在渗层中,渗层中不存在裂纹。
The pack aluminized and silicon aluminized at 620℃ for 6 hours on Ti-alloy sheet fabricated by electron beam physical vapor deposition (EB-PVD) technique was investigated. Surfaces and cross-sec- tions of the aluminized specimens were studied by scanning electron microscopy (SEM). Phase identification of the oxide scale was performed by X-ray diffraction (GAXRD) and energy dispersive analysis of X-rays (EDAX). The results show that aluminizing could be carried out at 620℃. The phase construction of the a- luminized coating is AI3 Ti. However, as Al3 Ti phase is brittle, it is easy to create crack in the cooling process due to the heat stress. After A1-Si co-infiltration at 620℃, the phases of the coating are Al3 Ti and Ti5Si3. The interface is clear but unsmooth.
出处
《宇航材料工艺》
CAS
CSCD
北大核心
2011年第6期63-65,69,共4页
Aerospace Materials & Technology
关键词
渗铝
铝硅共渗
微晶
钛合金薄板
Aluminized, Silicon aluminized, Microcrystal, Ti-based alloy sheet