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不同粘接剂对二氧化锆桩固位力的影响

Influence of Different Luting Agent on Retention of Zirconia Post-Core Crown
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摘要 目的探讨不同粘接剂对二氧化锆桩与根管内牙本质粘接强度的影响。方法将60颗完整无龋坏的离体上颌中切牙自釉牙骨质界处截断牙冠,根管桩道预备,制作二氧化锆桩核。60颗牙随机分为6组,分别用磷酸锌水门汀、聚羧酸锌水门汀、玻璃离子水门汀i、Bond加LuxaCore双固化树脂、RelyX Unicem树脂、32%磷酸加ESPE RelyX Unicem树脂粘固二氧化锆桩核。万能力学试验机进行推出测试,记录粘接强度,并对数据行统计学分析。结果 32%磷酸加ESPE RelyX Unicem树脂组、ESPE RelyX Unicem树脂组i、Bond加Luxa Core树脂组、聚羧酸锌水门汀组、玻璃离子水门汀组、磷酸锌水门汀组的二氧化锆桩粘接强度分别为(15.06±1.80)MPa、(11.57±1.33)MPa(、10.42±1.24)MPa(、7.30±1.05)MPa(、6.99±0.87)MPa(、3.97±0.95)MPa,固位力依次降低。其中32%磷酸加ESPE RelyX Unicem树脂组的固位力显著高于其他组,两两比较差异均有统计学意义(P<0.05);ESPE RelyX Unicem树脂组与Luxa Core树脂组之间(P=0.590),聚羧酸锌组和玻璃离子组之间(P=0.490)的差异均无统计学意义;磷酸锌水门汀的粘接强度最低,与其它组比较差异均有统计学意义(P<0.05)。结论临床粘固二氧化锆桩,树脂类粘接剂固位力较强,自粘接系统加用酸蚀技术可以显著提高二氧化锆桩在根管内的粘接强度。 Objective To evaluate the influence of different luting agent on retention of zirconia post-core crown.Methods Sixty extracted upper anterior teeth were endodontically treated,dowel space prepared,and divided into six groups.Each group was treated with different bonding procedures: Group A with zinc phosphate cement,Group B with zinc polycarboxylate cement,Group C with glass ionomer cement,Group D with self-etch system(iBond/LuxaCore),Group E with self-adhesive system(RelyX Unicem),and Group F with etching combined with self-adhesive system(32% phosphoric etching/RelyX Unicem).After dowel cementation,six thin-sliced specimens were made and a push-out test was performed to measure the bonding strength.Results The test showed that bonding procedures had significant impacts on the bond strength(F=178.09,P=0.00).Group F had the highest bond strength compared with other groups(P=0.01).Group A had the lowest bond strength(P=0.01).There was no difference between Group B and Group C(P=0.59),Group D and Group E(P=0.49).Conclusion Composite resin luting cement with total etch system seems to be the best way to cement zirconia posts compared.
出处 《广东牙病防治》 2011年第11期604-608,共5页 Journal of Dental Prevention and Treatment
关键词 粘接剂 二氧化锆桩 粘接强度 Luting cement Zirconia post-core Bond strength
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